A microlens projection photolithographic system
一种新型微透镜阵列成象式投影光刻系统的研究
Tienshihchai Photolithographic Publishing Works
点石斋石印书局
Impact on Photolithographic Spot Intensity Caused by Collimated Beam with Gaussian Attribute
准直光束高斯特征对直写光斑强度的影响
Photolithographic patterning and thin film deposition were used for manufacturing multilevel diffractive optical element.
应用光刻和薄膜沉积技术，制作了多级衍射光学元件。
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